The global photomask market was valued at USD 3546.16 million in 2018 and is forecasted to reach USD 4254.22 million by 2026, with a CAGR of 2.33% during the forecast period (2019-2026).
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography. It is tool used for productions of components including electronic devices (semiconductors), displays, PCB, MEMS. It is a master copy for the patterning. Photolithography is used to form PCB circuits and display patterns. Photomasks are used to transfer the patterns on the baseplates.
A photomask acts just like "negative film" in photography, and that makes the baseplates "printing paper“. Electronic devices, transistors, memories, display devices like LCD, OLED, MEMS, Magnetic heads for hard disks, and, heads for inkjet printers are the various applications for Photomask market. Globally, increasing demand of the semiconductors and increasing chip density are expected to play an important role in the growth of photomask in the forecast period.
Furthermore, Increasing focus of industry players on Internet of Things (IoT) in the current time poses a huge opportunity for photomask industry in the near future.
Market Dynamics
Drivers
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Growth of global flat panel display market & Use of wireless computing devices
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Increase in chip density
Restraints
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High capital investments
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Lack of new technologies for semiconductor device fabrication
Market Segmentation
The reticles photomask was valued at USD 1293.83 million in 2017 and the market is estimated to grow at a CAGR of 2.80% in the forecast period to reach a market value of USD 1650.09 million by 2026.
A Reticle is a specific type of photomask, containing one or many images that will make up the final device. Typically the original design is “Scaled Up” on the reticle, typically by a factor of 1X, 2X, 2.5X, 4X, 5X, 10X.
Reticle is used in the front end process of semiconductor fabrication.
Reticles have two major applications:
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Printing of images directly onto wafers in equipment known as step-and-repeat aligners
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Printing of images onto masks which, in turn, transfer the images onto wafers.
The polarity of a mask or reticle can either be positive or negative. A positive mask or reticle has background areas (or fields) that are clear or transparent, which is why a positive mask or reticle is also known as a 'clear-field' tool.
A negative mask or reticle has fields that are opaque, which is why a negative mask or reticle is also known as a 'dark-field' tool.
Geographical Analysis
The photomask market in APAC was valued at USD 2357.60 million in 2017. The market is estimated to grow to USD 2945.84 million in 2026, growing at a CAGR of 2.57% during the forecast period.
APAC is the leader in the global photomask market in 2017. South Korea, Japan, and Taiwan are the three key leading countries in this region. These three countries make up approximately 58.74% of the total global photomask market. These countries are also home to companies that dominate the electronics manufacturing industry, a key reason for the dominance of the APAC region in this market.
China is another emerging key country in the region. China has a huge demand for semiconductor components, especially integrated chips. Currently, more than two-third of the demand for ICs in China is fulfilled by US firms like Intel.
The Chinese government lately, has started taking note of the situation, and has introduced policy changes to boost the Chinese domestic semiconductor industry, especially the manufacturing sector. With increased domestic production of ICs, photomasks, which form an integral part of ICs, are also expected to boost the Chinese economy.
The high concentration of major electronic device manufacturers such as Haier, Huawei, Lenovo, LG Electronics, Samsung, and Sony in APAC is also expected to help the region contribute significantly to the market.
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